Hello! I am a PhD candidate at Ohio State University currently working on wide and ultrawide bandgap semiconductors. I work on making crystalline semiconductor materials via metal-organic chemical vapor deposition, fabricate semiconductor devices and test them out!
I have been working on semiconductor fabrication techniques since my sophomore year at RIT as an undergraduate student in the Microelectronic Engineering program.
Over the years, I have worked on a range of materials and material systems including GaN, AlN, AlScN, MgSiN2, Ga2O3, LiGa5O8 and Si.
Wide-Bandgap (WBG) and Ultra-Wide-Bandgap (UWBG) Semiconductors – Research on GaN, AlScN, MgSiN₂, and emerging oxides like Ga2O3 and LiGa5O8 for high-performance electronics and power devices
MOCVD Growth – Expertise in metal-organic chemical vapor deposition (MOCVD) of high-quality materials, with emphasis on epitaxial growth optimization, doping strategies, and heterostructure development and engineering. Expertise in wurtzite-structured nitride MOCVD growth
Materials Characterization – Proficient in performing and analyzing data from multiple material characterization techniques including XRD, AFM, photoluminescence, cathodoluminescence, SEM, EDX, SIMS
Device Design, Microfabrication & Testing – Extensive experience in simulating, designing, fabricating, and evaluating devices such as CMOS and PMOS Si-based devices, ultrawide-bandgap vertical heterojunction diodes, GaN nanowire memory transistor, light-emitting diodes, MEMS micro-mirrors, and ferroelectric nitride structures.
The Ohio State University, OH USA
August 2021 - Present
GPA: 3.90 / 4.00
Rochester Institute of Technology, NY USA
August 2019 - May 2021
GPA: 3.96 / 4.00
Rochester Institute of Technology, NY USA
August 2014 - May 2019
Assistant for Training and Education Development June 2016 - August 2016
Produced course material, aided in script writing, shooting videos and editing final videos to aid in training professionals and students in cleanroom processes and equipment use at the Stanford Nanofabrication Facility
Lithography Engineer Intern September 2016 - December 2016
Manufacturing: Processed and manufactured optical parts for cell counters, calibration standards etc., by improving exposure, development and etching parameters to obtain specified size. Manufactured customer specified photomask designs
Knowledge Management: Created and updated standard operating procedure documentation for new and existing manufacturing processes and tools
Process Engineer Intern January 2018 - July 2018
Manufacturing: Processed and manufactured electrical, optical, opto-electronic parts, and thin film flex circuits.
Process Optimization: Increased manufacturing yield of optical filter from 40% to 90% through optimization experiments, finding ideal process parameters for exposure, development, and sputtering
Quality Assurance: Conducted Quality Control tests on manufactured components. Developed and implemented a tool to track first pass yield, throughput yield, process step yield, and quantity of manufactured parts to improve process parameters
Mentoring & Knowledge Management: Trained technicians in process manufacturing techniques. Created and updated standard operating procedure documentation for new and existing manufacturing processes respectively
Manufacturing Engineer Intern May 2020 - August 2020
Worked in Metrology Engineering department within a team of process owners. Worked with sampling and automation engineer to develop models and simulation sets for run-to-run control and show effects of sampling rates and run-to-run control factors on overall process performance and key process performance metrics for nanofabrication processes with non-linear drifts.
M. Hartensveld, B. Melanson, V. Thirupakuzi Vangipuram, and J. Zhang, “450 nm Gallium Nitride Alternating Current Light-Emitting Diode,” IEEE Photonics Journal 12(6), 1–6 (2020)
K. Zhang, C. Hu, A.F.M.A.U. Bhuiyan, M. Zhu, V.G.T. Vangipuram, M.R. Karim, B.H.D. Jayatunga, J. Hwang, K. Kash, and H. Zhao, “Pulsed-Mode MOCVD Growth of ZnSn(Ga)N2 and Determination of the Valence Band Offset with GaN,” Crystal Growth & Design 22(8), 5004–5011 (2022)
V. Talesara, Y. Zhang, V.G.T. Vangipuram, H. Zhao, and W. Lu, “Vertical GaN-on-GaN pn power diodes with Baliga figure of merit of 27 GW/cm2,” Applied Physics Letters 122(12), 123501 (2023)
Y. Zhang, V.G. Thirupakuzi Vangipuram, K. Zhang, and H. Zhao, “Investigation of carbon incorporation in laser-assisted MOCVD of GaN,” Applied Physics Letters 122(16), 162101 (2023)
K. Zhang, C. Hu, V.G. Thirupakuzi Vangipuram, K. Kash, and H. Zhao, “Design of InGaN-ZnSnGa2N4 quantum wells for high-efficiency amber light emitting diodes,” Journal of Vacuum Science & Technology A 41(3), 033206 (2023)
Y. Xu, V.G.T. Vangipuram, V. Talesara, J. Cheng, Y. Zhang, T. Hashimoto, E. Letts, D. Key, H. Zhao, and W. Lu, “7.86 kV GaN-on-GaN PN power diode with BaTiO3 for electrical field management,” Applied Physics Letters 123(14), 142105 (2023)
K. Zhang, C. Hu, V.G. Thirupakuzi Vangipuram, L. Meng, C. Chae, M. Zhu, J. Hwang, K. Kash, and H. Zhao, “Effect of varying threading dislocation densities on the optical properties of InGaN/GaN quantum wells with intentionally created V-shaped pits,” Journal of Vacuum Science & Technology B 41(6), 062207 (2023)
V.G. Thirupakuzi Vangipuram, K. Zhang, and H. Zhao, “Suppressing Carbon Incorporation in Metal–Organic Chemical Vapor Deposition GaN Using High-Offcut-Angled Substrates,” Physica Status Solidi (RRL) – Rapid Research Letters 18(3), 2300318 (2024)
K. Zhang, V.G. Thirupakuzi Vangipuram, C. Chae, J. Hwang, and H. Zhao, “Experimental determination of the band offsets at the UWBG p-LiGa5O8/Ga2O3 interface,” Applied Physics Letters 124(12), 122106 (2024)
V.G. Thirupakuzi Vangipuram, K. Zhang, and H. Zhao, “Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO2,” Journal of Vacuum Science & Technology B 42(3), 032204 (2024)
K. Zhang, V.G.T. Vangipuram, H.-L. Huang, J. Hwang, and H. Zhao, “Discovery of a Robust P-Type Ultrawide Bandgap Oxide Semiconductor: LiGa5O8,” Advanced Electronic Materials 11(1), 2300550 (2025)
C. Hu, A. Mukit, V.G. Thirupakuzi Vangipuram, C. Chae, J. Hwang, K. Kash, and H. Zhao, “Optimizing Metal-Organic Chemical Vapor Deposition for Ultrawide Bandgap MgSiN2 Thin-Films,” Physica Status Solidi (RRL) – Rapid Research Letters n/a(n/a), 2500109 (2025)
M. Daeumer, J.-H. Yoo, Z. Xu, M. Cho, M. Bakhtiary-Noodeh, T. Detchprohm, Y. Zhang, V.G. Thirupakuzi Vangipuram, V. Talesara, Y. Xu, E. Letts, D. Key, T.T. Li, Q. Shao, R. Dupuis, S.-C. Shen, W. Lu, H. Zhao, T. Hashimoto, and T.A. Laurence, “Three-dimensional photoluminescence imaging of threading dislocations in GaN by sub-band optical excitation,” Sci Rep 15(1), 333 (2025)
V.G. Thirupakuzi Vangipuram, K. Zhang, D.S. Yu, L. Meng, C. Chae, Y. Xu, J. Hwang, W. Lu, and H. Zhao, “Ultrawide bandgap LiGa5O8/β-Ga2O3 heterojunction p–n diodes,” APL Electronic Devices 1(1), 016115 (2025)
C. Hu, V.G.T. Vangipuram, C. Chae, I.K. Turan, N. Hoven, W.R.L. Lambrecht, J. Hwang, Y. Ijiri, H. Zhao, and K. Kash, “Metal-organic chemical vapor deposition of MgGeN2 films on GaN and sapphire,” (2025)
K. Zhang, V.G. Thirupakuzi Vangipuram, and H. Zhao, “Experimental analysis of potential origin of p-type conductivity in LiGa5O8,” APL Materials 13(4), 041104 (2025)
A.F.M.A.U. Bhuiyan, L. Meng, D.S. Yu, S. Dhara, H.-L. Huang, V.G.T. Vangipuram, J. Hwang, S. Rajan, and H. Zhao, “Electrical and structural characterization of in situ MOCVD Al2O3/β-Ga2O3 and Al2O3/β-(AlxGa1−x)2O3 MOSCAPs,” Journal of Applied Physics 137(17), 174101 (2025)
V.G. Thirupakuzi Vangipuram, C. Hu, A. Mukit, C. Chae, K. Zhang, J. Hwang, K. Kash, and H. Zhao, “Metal–Organic Chemical Vapor Deposition of MgSiN2 Thin Films,” Crystal Growth & Design 25(13), 4747–4755 (2025)
L. Meng, V.G. Thirupakuzi Vangipuram, D.S. Yu, C. Hu, and H. Zhao, “Metalorganic chemical vapor deposition in situ etching of β-Ga2O3 and β-(AlxGa1−x)2O3,” Journal of Vacuum Science & Technology B 43(5), 052201 (2025)
K. Zhang, V.G.T. Vangipuram, L. Meng, C. Chae, J. Hwang, and H. Zhao, “Mist Chemical Vapor Deposition of Ultrawide Bandgap p-LiGa5O8 on AlN and Determination of the Band Offsets at the LiGa5O8/AlN Interface,” Physica Status Solidi (RRL) – Rapid Research Letters n/a(n/a), 2500192 (2025)
D.S. Yu, L. Meng, V.G. Thirupakuzi Vangipuram, C. Chae, J. Hwang, and H. Zhao, “Metal–organic chemical vapor deposition of p-type NiO and NiO/β-Ga2O3 PN diodes,” APL Electronic Devices 1(4), 046104 (2025)
W. Li, Y. Zhang, V.G. Thirupakuzi Vangipuram, H. Zhao, S.A. Ringel, and A.R. Arehart, “The impact of laser and growth rate on trap formation in conventional and laser-assisted MOCVD GaN,” Applied Physics Letters 127(14), 142104 (2025).
Y.Xu, V.G. Thirupakuzi Vangipuram, E. Letts, T. Hashimoto, H. Zhao, W. Lu, ">10 kV GaN-on-GaN PN Power Diode with Double Field Plate Structure", Physica Status Solidi (RRL) -Rapid Research Letters (2025) (submitted)
V.G. Thirupakuzi Vangipuram, A. Mukit, K. Zhang, S. Salmani-Rezaie, H. Zhao, “Metalorganic Chemical Vapor Deposition of AlScN Thin Films and AlScN/AlN/GaN Heterostructures”, Crystal Growth & Design (2025) (submitted)
A. Mukit, C. Hu, V.G. Thirupakuzi Vangipuram, J. Liu, A. Akoto-Yeboah, Z. Mi, S. Salmani-Rezaie, K. Kash, H. Zhao, “A Comprehensive Study of Metal-Organic Chemical Vapor Deposition of Ultrawide-Bandgap MgSiN2 Thin Films on Sapphire,”, Journal of Applied Physics (2025) (submitted)
Lester Eastman Conference, 2023, Chicago IL
Suppressing Carbon Incorporation in MOCVD GaN for Vertical Power Device Applications
Vijay Gopal Thirupakuzi Vangipuram, Yuxuan Zhang, Kaitian Zhang, and Hongping Zhao
CHPPE Annual Review, 2023, Columbus OH
Developing Vertical GaN PN Diodes
Vijay Gopal Thirupakuzi Vangipuram, Yuxuan Zhang, Kaitian Zhang, and Hongping Zhao
GOX 2024, Columbus OH
Etching Study and Ohmic Contact Formation to UWBG p-Type LiGa5O8
Vijay Gopal Thirupakuzi Vangipuram, Kaitian Zhang and Hongping Zhao
American Physical Society (APS) March Meeting, 2025, Anaheim CA
MOCVD growth and properties of ultrawide bandgap MgSiN2
Vijay Gopal Thirupakuzi Vangipuram, Chenxi Hu, Christopher Chae, Abdul Mukit, Kaitian Zhang, Jinwoo Hwang, Kathleen Kash, and Hongping Zhao
Ohio State Materials and Manufacturing Conference, 2025, Columbus OH
MOCVD Growth and Properties of a New Ultrawide Bandgap Material: MgSiN2
Vijay Gopal Thirupakuzi Vangipuram, Chenxi Hu, Christopher Chae, Abdul Mukit, Kaitian Zhang, Jinwoo Hwang, Kathleen Kash, and Hongping Zhao
V.G.T. Vangipuram, Y. Xu, W. Lu, and H. Zhao, “Laser-Assisted MOCVD GaN and the Development of Vertical GaN-on-GaN PN Diodes,” in Gallium Nitride and Related Materials: Device Processing and Materials Characterization for Power Electronics Applications, edited by I.C. Kizilyalli, J. Han, J.S. Speck, and E.P. Carlson, (Springer Nature Switzerland, Cham, 2025), pp. 149–180
IC Technology
Statistics and Design of Experiments
Lithography Materials and Processing
Semiconductor Process Integration
Semiconductor Device Physics
Thin Films
Nanolithography Systems
MEMS Fabrication
CMOS Processing
Microelectronic Manufacturing
SiGe and SOI Devices and Technologies
Physics of Nanostructures
Physical Modeling of Semiconductor Devices
Epitaxial Crystal Growth
Fundamentals of Semiconductors
Si and Wide Bandgap Power Devices
Fundamentals of Semiconductor Devices
Semiconductor Optoelectronic Devices
Semiconductor Process Technology
Design and Processing of WBG Devices
LinkedIn: www.linkedin.com/in/vijaygopaltv
Email:
thirupakuzivangipuram.1@buckeyemail.osu.edu
Phone:
585-755-4640